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Non-contact Layer Thickness Measurement
The non-contact layer thickness measurement
systems for transparent layers work efficiently and
are easy to operate. The measurement systems function according
to the principle of the reflection spectroscopy. Using complex
algorithms, the spectra of individual layers as well as entire
layer systems are analyzed. For analyzing the spectra and determining
the layer thickness as well as optical constants n and k, these
non-contact layer thickness measurement systems offer extensive
algorithms with different material data that can be complemented
at any time. The non-contact layer thickness measurement systems
are available for measuring extremely thin layers of a few Angstrom
to thick layers of close to 500µm. Across the sample table,
all positions on the sample can be measured with the assistance
of polar coordinates. In addition to the standard measurement
plans supplied with the system, client-specific measurement
plans with any number of measurement sites are easy to create.
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The non-contact
layer thickness measurement systems are available for
wafers with diameters between 100mm and 300mm. The measurement
speed is extremely high in this system, so that a complete
wafer map with 56 data points is completed in only approx.
29 seconds (200mm wafer). The graphical representation
of the measurement results shows the distribution of the
layer thickness across the entire wafer immediately and
clearly. With a measurement spot of only 200µm,
measurements are possible within small structures.
Request more information.
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